DOKK / manpages / debian 12 / libpano13-bin / PTmasker.1.en
PTMASKER(1) LIBPANO13 TOOLS PTMASKER(1)

PTmasker - Compute stitching masks

PTmasker [options] tiff_file(s)

PTmasker computes stitching masks. It implements the ability to increase depth-of-field by stacking images.

Prefix for output files (defaults to masked%4d).
Size of the feather (defaults to zero).
Force processing (do not stop on warnings).
Delete source files (use with care).
Quiet run.
Output help summary.
Enable Extended depth of field.
Focus estimation mask type.
0 hard-edged masks, mutually exclusive
1 hard-edged masks, stack of nested masks
2 blended masks, stack of nested masks

2 is default and strongly recommended: This option includes a smoothing computation that seems to help a lot.

Focus estimation window size. Only available if -z.

Recommended value is 0.51001114526f image width, e.g. 4 pixels for an 800-pixel image.

Computation cost for focus estimation increases proportional to N^2. Defaults to w4.

Smoothing window size. Only available if -z.

Recommended value is 0.50f image width, e.g. 4 pixels for an 800-pixel image.

Computation cost for focus estimation increases proportional to N^2. Defaults to w4.

Panorama Tools was originally created by Professor Helmut Dersch, it's now maintained by Bruno Postle <bruno@postle.net>.

PTmasker was written by Daniel M German <dmgerman@uvic.ca>.

This manpage was written by Cyril Brulebois <cyril.brulebois@enst-bretagne.fr> and is licensed under the same terms as the libpano13 package itself.

2023-01-22 Version: 2.9.21